Formation mechanism and crystallographic relationship of epitaxy Ti and Al thin films in ionized metal plasma deposition

Surface Review and Letters

Volumn 8, Issue 5, 2001, Pages 465-469

  Li, S ^a   Lee, Y K ^a   Sun, C Q ^a   Liang, M H ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; TITANIUM;

ANISOTROPY; ARTICLE; CRYSTALLOGRAPHY; DIFFUSION; FILM; HIGH TEMPERATURE; IONIZATION; TECHNIQUE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0035740933     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0218-625X(01)00138-5     Document Type: Article

References (8)