Formation of Ti silicide nanocrystals in the amorphous interlayers in ultrahigh-vacuum-deposited Ti thin films on (001)Si

Journal of Applied Physics

Volumn 98, Issue 3, 2005, Pages

  Yang, T H ^a   Chi, K S ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS INTERMIXING; AUTOCORRELATION FUNCTION ANALYSIS; PHASE FORMATION; SILICIDE NANOCRYSTALS;

ANNEALING; DEPOSITION; FREE ENERGY; IMAGE ANALYSIS; SILICON COMPOUNDS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAHIGH VACUUM;

NANOSTRUCTURED MATERIALS;

EID: 23944486407     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1988977     Document Type: Article

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