Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 32-35

  Miyagi, Takahira ^a,b   Kamei, Masayuki ^a   Ogawa, Tomoyuki ^a,c   Mitsuhashi, Takefumi ^a   Yamazaki, Atsushi ^a,b   Sato, Tetsuya ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

Crystallization; Photocatalyst; Sputtering; Titanium oxide

Indexed keywords

CRYSTALLIZATION; FILM GROWTH; GLASS; MAGNETRON SPUTTERING; SILICA; SUBSTRATES; THERMAL EFFECTS; TITANIUM DIOXIDE;

PULSE MODE EFFECTS;

THIN FILMS;

EID: 0141427833     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00934-9     Document Type: Conference Paper

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