A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge

Plasma Sources Science and Technology

Volumn 13, Issue 2, 2004, Pages 189-198

  Bradley, J W ^a   Karkari, S K ^a   Vetushka, A ^a  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CATHODES; COATINGS; DIELECTRIC FILMS; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; FREQUENCIES; ION IMPLANTATION; MAGNETRONS; PERTURBATION TECHNIQUES; PLASMA DENSITY; PLASMA PROBES; PLASMA SHEATHS; THIN FILMS;

DC MAGNETRON DISCHARGES; ELECTRON PLASMA FREQUENCY; EMISSIVE PROBE TECHNIQUES; PARTICLE DRIFTS;

PLASMA SOURCES;

EID: 2942538004     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/2/001     Document Type: Article

References (38)

1. Scholl R A 1998 Surf. Coat. Technol. 98 823
2. Schiller S, Goedicke K, Reschke J, Kirchhoff V, Schneider S and Milde F 1993 Surf. Coat. Technol. 61 331
3. Kelly P J and Arnell R D 1999 J. Vac. Sci. Technol. A 17 945
4. Bradley J W, Bäcker H, Aranda-Gonzalvo Y, Kelly P J and Arnell R D 2002 Plasma Sources Sci. Technol. 11 165-74
5. Bradley J W, Bäcker H, Kelly P J and Arnell R D 2000 Surf. Coat. Technol. 135 221-8
6. Bradley J W, Bäcker H, Kelly P J and Arnell R D 2001 Surf. Coat. Technol. 142-144 337-41
7. Belkind A, Freilich A and Scholl R 1998 Surf. Coat. Technol. 108-109 558
8. Belkind A, Freilich A and Scholl R 1999 J. Vac. Sci. Technol. A 17 1934
9. Sproul W D 1998 Vacuum 51 641
10. Kelly P J, Abu-Zeid O A, Arnell R D and Tong J 1996 Surf. Coat. Technol. 86-87 28
11. Glocker D A 1993 J. Vac. Sci. Technol. A 11 2989
12. Karkari S K, Bäcker H, Forder D and Bradley J W 2002 Meas. Sci. Technol. 13 1431
13. Misina M, Bradley J W, Bäcker H, Aranda-Gonzalvo Y, Karkari S K and Forder D 2002 Vacuum 68 171
14. Waits R K 1978 J. Vac. Sci. Technol. 15 179
15. Thornton J A 1978 J. Vac. Sci. Technol. 15 171
16. Rossnagel S M and Kaufman H R 1987 J. Vac. Sci. Technol. A 5 88
17. Sheridan T E, Goeckner M J and Goree J 1998 J. Vac. Sci. Technol. A 16 2173
18. Dote T and Amemiya H 1964 Japan. J. Appl. Phys. 3 89
19. Van der Staaten T A, Cramer N F, Falconer I S and James B W 1998 J. Phys. D: Appl. Phys. 31 177
20. Sheridan T E, Goeckner M J and Goree J 1991 J. Vac. Sci. Technol. A 9 688
21. Swift J D and Schwar MJR 1970 Electric Probes for Plasma Diagnostics (London: Iliffe)
22. Bradley J W, Thompson S M and Gonzalvo Y A 2001 Plasma Sources Sci. Technol. 10 490
23. Ding G, Scharer J E and Kelly K L 1998 J. Appl. Phys. 84 1236
24. Lieberman M A 1989 J. Appl. Phys. 66 2926
25. Hershkowitz N 1994 IEEE Trans. Plasma Sci. 22 11
26. Ye M Y and Takamura S 2000 Phys. Plasmas 7 3457
27. Kemp R F and Seilen J M 1966 Rev. Sci. Instrum. 37 455
28. Chen F F 1965 Plasma Diagnostic Techniques ed E Huddlestone and S L Leonard (New York: Academic)
29. Wang E Y, Intrator T and Hershkowitz D N 1985 Rev. Sci. Instrum. 56 519
30. Smith J R, Hershkowitz N and Coakley P 1979 Rev. Sci. Instrum. 50 210
31. Bradley J B, Khamis R A, Sanduk M I, Elliott J A and Rusbridge M G 1992 J. Phys. D: Appl. Phys. 25 1443
32. Diebold D A, Hershkowitz N, Few J, Sorensen J, Tanaka T, Walsh R, Wang E Y, Wang X and Winz G 1995 Rev. Sci. Instrum. 66 434
33. Mravlag E and Krumm P 1990 Rev. Sci. Instrum. 61 2165
34. Cho M H, Hershkowitz N and Intrator T 1988 J. Vac. Sci. Technol. A 6 2978
35. Iizuka S, Michelsen P, Juul Rasmussen J, Schrittwieser R, Hatakeyamma R, Saeki K and Sato N 1981 J. Phys. E: Sci. Instrum. 14 1291
36. Muretore C, Moore J J and Rees A 2003 Surf. Coat. Technol. 163 12
37. Allen J E 1985 Plasma Phys. Control. Fusion A 27 1343
38. Yatsuzuka M, Miki S, Monta R, Azuma K and Fujwara E 2001 Surf. Coat. Technol. 136 93