Micropatterning of chemical-vapor-deposited diamond films in electron beam lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 B, 2000, Pages 4532-4535

  Kiyohara, Shuji ^a   Ayano, Kenjiro ^a   Abe, Takahisa ^a   Mori, Katsumi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Chemical vapor deposited diamond film; Electron beam lithography; Electron cyclotron resonance oxygen plasma; Metal naphthenate; Micropattern

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ELECTRON BEAM LITHOGRAPHY; ELECTRON CYCLOTRON RESONANCE; NAPHTHALENE; PLASMA ETCHING; RAMAN SPECTROSCOPY;

MICROPATTERNING;

DIAMOND FILMS;

EID: 0034228913     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.4532     Document Type: Article

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