Nanopatterning of diamond films with composite oxide mask of metal octylates in electron beam lithography

Journal of Materials Science: Materials in Electronics

Volumn 15, Issue 2, 2004, Pages 99-102

  Kiyohara, Shuji ^a   Takamatsu, Hideaki ^a   Motoishi, Taku ^a   Mori, Katsumi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON CYCLOTRON RESONANCE; MASKS; MICROWAVES; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY;

MASK LIQUIDS; SPIN COATINGS;

DIAMOND FILMS;

EID: 0742320617     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSE.0000005384.49423.0e     Document Type: Article

References (7)

1. S. KIYOHARA, K. AYANO and K. MORI, Jpn. J. Appl. Phys. 39 (2000) 4532.
2. S. SHIKATA,Y. NISHIBAYASHI, T. TOMIKAWA, N. TODA and N. FUJIMORI, in "Proceedings of the Second International Conference on the Applications of Diamond Films and Related Materials", edited by M. Yoshikawa et al. (Omiya, Saitama, Japan, 1993) p. 377.
3. A. KAKIMI, S. OKAMURA, Y. YAGI, K. MORI and T. TSUKAMOTO, Jpn. J. Appl. Phys. 33 (1994) 5301.
4. S. OKAMURA, Y. YAGI, S. ANDO, T. TSUKAMOTO and K. MORI, Ibid. 35 (1996) 6579.
5. S. KIYOHARA and K. MORI, in "Proceedings of the Sixth Applied Diamond Conference/Second Frontier Carbon Technology Joint Conference", edited by Y. Tzeng et al. (Auburn University, Alabama, USA, 2001) p. 317.
6. S. MATSUI and K. MORI, J. Vac. Sci. Technol. B 4 (1986) 299.
7. S. OKAMURA and T. SHIOSAKI, Proceedings of the Eleventh IEEE International Symposium on Applications of Ferroelectrics (Montreux, Switzerland, 1998) p. 18.