Nanopatteming of chemical vapor deposited diamond films in room temperature nanoimprint lithography using diamond molds

Materials Research Society Symposium Proceedings

Volumn EXS, Issue 2, 2004, Pages 73-75

  Kiyohara, Shuji ^a   Takamatsu, Hideaki ^a   Motoishi, Taku ^a   Mori, Katsumi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON CYCLOTRON RESONANCE; NANOTECHNOLOGY; PLASMA ETCHING; PLASTICS MOLDING; POLYACRYLATES;

DIAMOND MOLDS; MASK MATERIALS; NANOPATTERNING; ROOM TEMPERATURE;

DIAMOND FILMS;

EID: 23844484865     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. S. Kiyohara, H. Takamatsu and K. Mon, J. Mater. Sci. Mater. in Electron. 15, 99 (2004) (in press).
2. S.Y.Chou, P.R. Krauss and P.J. Renstorm, Appl. Phys. Lett. 67, 3114 (1995).
3. S. Matsui, Y. Igaku, H. Ishigald et al, J. Vac. Sci. Technol. B21, 688 (2003).