Plasma etching of CVD diamond films using an ECR-type oxygen source

Nanotechnology

Volumn 10, Issue 4, 1999, Pages 385-388

  Kiyohara, Shuji ^a   Yagi, Yukie ^a   Mori, Katsumi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; OXYGEN; PLASMA ETCHING; PLASMA SOURCES; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS;

MICROWAVE POWER;

DIAMOND FILMS;

EID: 0033310848     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/4/304     Document Type: Article

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