Second-harmonic generation from SiSi O 2 Hf (1-x) Six O 2 structures

Applied Physics Letters

Volumn 88, Issue 16, 2006, Pages

  Carriles, R ^a   Kwon, J ^a   An, Y Q ^a   Miller, J C ^a   Downer, M C ^a   Price, J ^b   Diebold, A C ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER EPITAXY; OXIDE LAYERS; POSTDEPOSITION;

ANNEALING; DEPOSITION; ELECTRIC SPACE CHARGE; SECOND HARMONIC GENERATION; SILICON; SPECTROSCOPIC ANALYSIS;

THIN FILMS;

EID: 33646196057     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2197935     Document Type: Article

References (19)

1. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
2. J. Price, P. Y. Hung, T. Rhoad, B. Foran, and A. C. Diebold, Appl. Phys. Lett. 85, 1701 (2004).
3. H. Takeuchi, D. Ha, and T. J. King, J. Vac. Sci. Technol. A 22, 1337 (2004).
4. S. Ramanathan, P. C. McIntyre, J. Luning, P. S. Lysaght, Y. Yang, Z. Chen, and S. Stemmer, J. Electrochem. Soc. 150, F173 (2003).
5. S. Stemmer, Y. Li, B. Foran, P. S. Lysaght, S. K. Streiffer, P. Fuoss, and S. Seifert, Appl. Phys. Lett. 83, 3141 (2003).
6. R. Ludeke and E. Gusev, J. Appl. Phys. 96, 2365 (2004).
7. M.-H. Cho, K. B. Chung, C. N. Whang, D. W. Lee, and D.-H. Ko, Appl. Phys. Lett. 87, 242906 (2005).
8. C. C. Fulton, G. Lucovsky, and R. J. Nemanich, Appl. Phys. Lett. 84, 580 (2004).
9. C. C. Fulton, T. E. Cook, G. Lucovsky, and R. J. Nemanich, J. Appl. Phys. 96, 2665 (2004).
10. D. Lim and R. Haight, J. Vac. Sci. Technol. B 23, 201 (2005).
11. G. Lüpke, Surf. Sci. Rep. 35, 75 (1999).
12. Yu. D. Glinka, W. Wang, S. K. SIngh, Z. Marka, S. N. Rashkeev, and Y. Shirokaya, Phys. Rev. B 65, 193103 (2002).
13. V. Fomenko, E. P. Gusev, and E. Borguet, J. Appl. Phys. 97, 083711 (2005).
14. P. T. Wilson, Y. Jiang, R. Carriles, and M. C. Downer, J. Opt. Soc. Am. B 20, 2548 (2003).
15. J. I. Dadap, X. F. Hu, M. H. Anderson, M. C. Downer, J. K. Lowell, and O. A. Aktsipetrov, Phys. Rev. B 53, R7607 (1996).
16. D. Lim, M. C. Downer, and J. G. Ekerdt, Appl. Phys. Lett. 77, 181 (2000).
17. W. Daum, H.-J. Krause, U. Reichel, and H. Iback, Phys. Rev. Lett. 71, 1234 (1993).
18. G. Lucovsky, H. Yang, and H. Z. Massoud, J. Vac. Sci. Technol. B 16, 2191 (1998).
19. W. Wang, G. Lüpke, M. Di Ventra, S. T. Pantelides, J. M. Gilligan, N. H. Tolk, I. C. Kizilyalli, P. K. Roy, G. Margaritondo, and G. Lucovsky, Phys. Rev. Lett. 81, 4224 (1998).