Influence of the energy parameter on the microstructure of chromium nitride coatings

Surface and Coatings Technology

Volumn 200, Issue 20-21, 2006, Pages 5743-5750

  Olaya, J J ^a   Rodil, S E ^a   Muhl, S ^a   Huerta, L ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

Chromium nitride; Microstructure; Plasma parameters; Unbalanced magnetron sputtering

Indexed keywords

MAGNETRON SPUTTERING; MICROHARDNESS; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM NITRIDE COATINGS; ION-CURRENT DENSITIES; LANGMUIR PROBES; NITROGEN TO CHROMIUM RATIO;

CHROMIUM COMPOUNDS;

CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROHARDNESS; PLASMA APPLICATIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33645799728     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.136     Document Type: Article

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