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Thin Solid Films

Volumn 472, Issue 1-2, 2005, Pages 96-104

Nanostructured chromium nitride films with a valley of residual stress

(4) Zhao, Z B a Rek, Z U b Yalisove, S M c Bilello, J C c

a DELPHI CORPORATION (United States)

b SLAC NATIONAL ACCELERATOR LABORATORY (United States)

c UNIVERSITY OF MICHIGAN (United States)

Author keywords

Coatings; Nanostructures; Residual stress; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM COMPOUNDS; COMPRESSIVE STRESS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; RESIDUAL STRESSES; SURFACE ROUGHNESS; SYNCHROTRON RADIATION; TEXTURES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

DOUBLE-CRYSTAL DIFFRACTION TOPOGRAPHY (DCDT); GRAIN STRUCTURES; TRI-AXIAL TEXTURES;

METALLIC FILMS;

EID: 9944223734 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.06.116 Document Type: Article

Times cited : (49)

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