Thermal annealing in Hydrogen for 3-D profile transformation on silicon-on-insulator and sidewall roughness reduction

Journal of Microelectromechanical Systems

Volumn 15, Issue 2, 2006, Pages 338-343

  Lee, Ming Chang M ^a,b   Wu, Ming C ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Annealing; Surface diffusion; Surface roughness

Indexed keywords

DIFFUSION IN SOLIDS; HYDROGEN; PRESSURE EFFECTS; SILICON ON INSULATOR TECHNOLOGY; SURFACE ROUGHNESS; THERMAL EFFECTS;

PROFILE TRANSFORMATION; SIDEWALL ROUGHNESS REDUCTION; SURFACE DIFFUSION; THERMAL ANNEALING;

ANNEALING;

EID: 33645757830     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2005.859092     Document Type: Article

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