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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 9 A, 2000, Pages 5033-5038

Micro-structure transformation of silicon: A newly developed transformation technology for patterning silicon surfaces using the surface migration of silicon atoms by hydrogen annealing

(4) Sato, Tsutomu a Mitsutake, Kunihiro a Mizushima, Ichiro a Tsunashima, Yoshitaka a

a TOSHIBA CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; DIELECTRIC PROPERTIES OF SOLIDS; MOLECULAR DYNAMICS; MORPHOLOGY; PHASE TRANSITIONS; REACTIVE ION ETCHING; SURFACES; TRANSMISSION ELECTRON MICROSCOPY; ULSI CIRCUITS;

HYDROGEN ANNEALING; MICROSTRUCTURE TRANSFORMATIONS;

SEMICONDUCTING SILICON;

EID: 0034268815 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.5033 Document Type: Article

Times cited : (82)

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