Impact of supercritical CO2 drying on roughness of hydrogen silsesquioxane e-beam resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 2, 2006, Pages 570-574

  Küpper, Daniel ^a   Küpper, David ^a   Wahlbrink, Thorsten ^a   Henschel, Wolfgang ^a,b   Bolten, Jens ^a   Lemme, Max C ^a   Georgiev, Yordan M ^a   Kurz, Heinrich ^a  

^a AMO GMBH   (Germany)

^b UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; ELECTRON BEAMS; NANOSTRUCTURED MATERIALS; OPTIMIZATION; SUPERCRITICAL FLUIDS; SURFACE ROUGHNESS;

HYDROGEN SILSESQUIOXANE; LINE-EDGE ROUGHNESS (LER); POLYMER AGGREGATE;

DRYING;

EID: 33645520287     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2167990     Document Type: Article

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