FIB based local deposition of dielectrics for phaseshift mask modification

Proceedings of SPIE- The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 148-157

  Wanzenboeck, H D ^a   Verbeek, M ^a   Maurer, W ^a   Bertagnolli, E ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

CVD; Focused ion beam; Mask repair; Phase shift mask; Silicondioxide; SiO2

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; ETCHING; GALLIUM; GLASS; ION BEAM ASSISTED DEPOSITION; LITHOGRAPHY; MATHEMATICAL MODELS; OXYGEN; PHASE SHIFT; SECONDARY ION MASS SPECTROMETRY; SILICA; SUBSTRATES; TRANSPARENCY;

FOCUSSED ION BEAMS (FIB); PHASESHIFT MASK MODIFICATION;

MASKS;

EID: 0035043105     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.410688     Document Type: Article

References (22)

1. "Photomask and X-Ray Mask Technology VI" (Yokohama)