Large area VHF plasma production using a ladder-shaped electrode

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 512-516

  Mashima, H ^a   Yamakoshi, H ^a   Kawamura, K ^a   Takeuchi, Y ^a   Noda, M ^a   Yonekura, Y ^a   Takatsuka, H ^a   Uchino, S ^b   Kawai, Y ^b  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

Ladder shaped electrode; Phase modulation method; Plasma CVD; VHF plasma

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRODES; PLASMA THEORY; PROBES;

LADDER-SHAPED ELECTRODE; PHASE MODULATION METHOD; PLASMA CVD; VHF PLASMA;

PLASMAS;

EID: 33645305658     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.110     Document Type: Conference Paper

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