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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 5 A, 2001, Pages 3405-3408

Characteristics of very-high-frequency-excited SiH4 plasmas using a ladder-shaped electrode

(5) Takeuchi, Yoshiaki a Mashima, Hiroshi a Murata, Masayoshi a Uchino, Satoshi b Kawai, Yoshinobu b

a MITSUBISHI HEAVY INDUSTRIES LTD (Japan)

b KYUSHU UNIVERSITY (Japan)

Author keywords

Ladder shaped electrode; Langmuir probe; Plasma; Plasma parameter; Very high frequency

Indexed keywords

CARRIER CONCENTRATION; ELECTRODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SILICON COMPOUNDS; THERMAL EFFECTS;

LANGMUIR PROBES;

PLASMAS;

EID: 0035328858 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.3405 Document Type: Article

Times cited : (20)

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