Inductively coupled radio frequency plasma chemical vapor deposition using a ladder-shaped antenna

Review of Scientific Instruments

Volumn 67, Issue 4, 1996, Pages 1542-1545

  Murata, Masayoshi ^a   Takeuchi, Yosiaki ^a   Sasagawa, Eishiro ^a   Hamamoto, Kazutoshi ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001206447     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1146885     Document Type: Article

References (8)

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