Characteristics of VHF-excited SiH4 plasmas using a ladder-shaped electrode

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 52-55

  Takeuchi, Yoshiaki ^a   Mashima, Hiroshi ^a   Murata, Masayoshi ^a   Uchino, Satoshi ^b   Kawai, Yoshinobu ^b  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

Ladder shaped electrode; Langmuir probe; Plasma CVD; Plasma paremeter; VHF plasma

Indexed keywords

FREQUENCIES; NEGATIVE IONS; PLASMA DENSITY; THERMAL EFFECTS;

PLASMA PARAMETERS;

ELECTRODES;

PLASMA TREATMENT;

EID: 0035386798     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01077-5     Document Type: Article

References (17)