Production of inductively coupled RF plasma using a ladder-shaped antenna

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4563-4567

  Murata, Masayoshi ^b   Mashima, Hiroshi ^a   Yoshioka, Masao ^a   Nishida, Seiichi ^b   Morita, Syoji ^b   Kawai, Yoshinobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

a Si:H films; High discharge frequency; Inductively coupled plasma; Ladder shaped antenna; Plasma CVD

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRIC DISCHARGES; PLASMA DENSITY; PLASMA FLOW; PLASMA PROBES; PRESSURE EFFECTS; SUBSTRATES;

INDUCTIVELY COUPLED PLASMAS (ICP); LANGMUIR PROBES; PLASMA CHAMBERS; PLASMA CHEMICAL VAPOR DEPOSITION; PLASMA DISCHARGES;

PLASMAS;

EID: 0031175874     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4563     Document Type: Article

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