Fabricating three dimensional nanostructures using two photon lithography in a single exposure step

Optics Express

Volumn 14, Issue 6, 2006, Pages 2300-2308

  Jeon, Seokwoo ^a   Malyarchuk, Viktor ^a   Rogers, John A ^a   Wiederrecht, Gary P ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; OPTICAL RESOLVING POWER; OPTICS; PHOTONS;

PARALLEL LITHOGRAPHIC TECHNIQUE; PHOTONICS; SUBWAVELENGTH RESOLUTION;

NANOSTRUCTURED MATERIALS;

EID: 33645067652     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.002300     Document Type: Article

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