Impact of phase behavior on photoresist removal using CO 2 based mixtures

Proceedings - Electrochemical Society

Volumn 26, Issue , 2003, Pages 263-270

  Levitin, Galit ^a   Myneni, Satyanarayana ^a   Hess, Dennis W ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH PRESSURE CELLS; PHASE BEHAVIOR; PHASE CONDITIONS;

CARBON DIOXIDE; DEPOSITION; HIGH PRESSURE EFFECTS; MIXTURES; RATE CONSTANTS; SILICA; SOLVENTS;

PHOTORESISTS;

EID: 3042742547     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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