Post-etch cleaning of 300mm dual damascene low-k dielectric structures using supercritical CO 2

Proceedings - Electrochemical Society

Volumn 26, Issue , 2003, Pages 254-262

  Turkot Jr , Robert B ^a   RamachandraRao, Vijayakumar S ^a   Iyer, Subramanyam A ^a   Clark, Shan C ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSOLVENTS; POST-ETCH CLEANING; WET ETCHING;

CARBON DIOXIDE; DIELECTRIC MATERIALS; ETCHING; MIXTURES; PHOTORESISTS; SUPERCRITICAL FLUIDS; SURFACE TENSION; VISCOSITY;

SURFACE CLEANING;

EID: 3042783240     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

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5. Combes, J. R., White , L. D., Tripp, C. P., "Chemical Modification of Metal Oxide Surfaces in Supercritical CO2: In situ Infrared Studies of the Adsorption and Reaction of Organosilanes on Silica", Langmuir 1999, 15, 7870.
6. A. Danel, et al., Proceedings of IITC'03, June 2003.