Designing photoresist systems for CO2-based microlithography

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 419-424

  Flowers, Devin ^a   Hoggan, Erik ^b   Carbonell, Ruben ^b   DeSimone, Joseph M ^a,b  

^a University of North Carolina at Chapel Hill   (United States)

^b North Carolina State University   (United States)

Author keywords

Dry processing; Environmentally friendly solvent; Image collapse; Liquid CO2; Non aqueous developer

Indexed keywords

CARBON DIOXIDE; ENVIRONMENTAL IMPACT; OPTICAL RESOLVING POWER; ORGANIC SOLVENTS; POLYMERS; SEMICONDUCTOR DEVICE MANUFACTURE; SPIN COATING; THIN FILMS;

IMAGE COLLAPSE;

PHOTORESISTS;

EID: 0036029808     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474240     Document Type: Article

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