Supercritical fluid processes for semiconductor device fabrication

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2002, Pages 372-375

  Rothman, Laura B ^a   Robey, Raymond J ^a   Ali, Mir K ^a   Mount, David J ^a  

^a SC Fluids Inc   (United States)

Author keywords

CO2; Photoresist strip; Supercritical fluids; Wafer cleaning

Indexed keywords

CARBON DIOXIDE; CLEANING; ORGANIC POLYMERS; PHOTORESISTS; PHYSICAL PROPERTIES; SOLVENTS; SUPERCRITICAL FLUIDS; SURFACE TENSION;

PHOTORESIST STRIP; SUPERCRITICAL FLUID PROCESS; WAFER CLEANING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0036073063     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. Separation with supercritical gases: Practical applications
2. The principles of gas extraction
3. CO2-based supercritical fluids as replacements for photoresist-stripping solvents
4. Evaluation of supercritical fluid interactions with polymeric materials