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Volumn , Issue , 2006, Pages 25-31

Interconnect modeling and analysis in the nanometer era: Cu and beyond

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; NUMERICAL ANALYSIS; RELIABILITY; VLSI CIRCUITS; COPPER; NANOSTRUCTURED MATERIALS; TECHNOLOGY TRANSFER;

EID: 33644945678     PISSN: 15401766     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (28)
  • 1
    • 33644961711 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors (ITRS), 2004, http://public.itrs.net
    • (2004)
  • 2
    • 19944432253 scopus 로고    scopus 로고
    • W. Steinhogl, et al., J. App. Physics, Vol. 97, No. 2, pp. 023706-1-023706-7, 2005.
    • (2005) J. App. Physics , vol.97 , Issue.2 , pp. 237061-237067
    • Steinhogl, W.1
  • 26
    • 0034428961 scopus 로고    scopus 로고
    • H. Stahl, et al., Physical Review Letters, Vol. 85, No. 24, pp. 5186-5189, 2000.
    • (2000) Physical Review Letters , vol.85 , Issue.24 , pp. 5186-5189
    • Stahl, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.