Preparation of AlN thin films by nitridation of Al-coated Si substrate

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 137-139

  Huang, Jipo ^a   Wang, Lianwei ^a   Shen, Qinwo ^a   Lin, Chenglu ^a   Östling, Mikael ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CRYSTAL ORIENTATION; EVAPORATION; FILM GROWTH; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; TEXTURES; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; CLOSELY PACKED GRANULAR TEXTURE; CRYSTALLINITY; ELECTRON BEAM EVAPORATION; PREFERRED ORIENTATION;

THIN FILMS;

EID: 0032624006     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01373-X     Document Type: Article

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