Deep ultraviolet raman microspectroscopic characterization of polishing-induced surface damage in SiC crystals

Journal of the Electrochemical Society

Volumn 153, Issue 4, 2006, Pages

  Nakashima, S ^a   Kato, T ^a   Nishizawa, S ^a   Mitani, T ^a   Okumura, H ^a   Yamamoto, T ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SUMITOMO CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; CARRIER CONCENTRATION; CRYSTAL LATTICES; CRYSTALS; DOPING (ADDITIVES); NITROGEN; PHONONS; POLISHING; SILICON CARBIDE; SPECTROSCOPY;

ABRASIVE POLISHING; LONGITUDINAL-OPTICAL-PHONON PLASMON; PHONON MODES;

SURFACE PROPERTIES;

EID: 33644831585     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2170546     Document Type: Article

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