Characterization of mechanically polished surfaces of single crystalline 6H-SiC

Materials Science Forum

Volumn 264-268, Issue PART 1, 1998, Pages 359-362

  Kanaya, M ^a   Yashiro, H ^a   Ohtani, N ^a   Katsuno, M ^a   Takahashi, J ^a   Shinoyama, S ^a  

^a NIPPON STEEL CORPORATION   (Japan)

Author keywords

Cross Sectional Transmission Electron Microscopy; Oxidation; Polishing; RBS; Surface Damage

Indexed keywords

CRYSTALLINE MATERIALS; OXIDATION; POLISHING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON CARBIDE; SINGLE CRYSTALS; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

SURFACE DAMAGE;

SILICON WAFERS;

EID: 3743078267     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.264-268.359     Document Type: Article

References (4)

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2. F. Owman, C. Hallin, P. Mårtensson and E. Janzén, J. Cryst. Growth 167 (1996) p. 391.
3. W.-K. Chu, J.W. Mayer and M.-A. Nicolet, Backscattering Spectrometry (Academic Press, Orlando, 1978)
4. T. Kobayashi, M. Iwaki, M. Aono and Y. Inomata, J. Appl. Phys. 65 (1989) p. 1970.