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Volumn 308-310, Issue , 2001, Pages 13-17
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Misfortune, challenge, and success: Defects in processed semiconductor devices
a
SIEMENS AG
(Germany)
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Author keywords
Device; Dislocation; Stress; Transmission electron microscopy
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Indexed keywords
COMPUTER SIMULATION;
DISLOCATIONS (CRYSTALS);
DRY ETCHING;
SEMICONDUCTING SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
SILICIDATION DEFECTS;
SEMICONDUCTOR DEVICES;
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EID: 0035673505
PISSN: 09214526
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-4526(01)00652-4 Document Type: Article |
Times cited : (5)
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References (19)
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