Fabrication of nano electron source using beam-assisted process

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 4037-4040

  Murakami, Katsuhisa ^a   Jarupoonphol, Werapong ^a   Sakata, Kazuaki ^a   Takai, Mikio ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Electron beam (EB); Electron beam induced deposition; Field emission electron source; Focused ion beam (FIB); Tetraethyl orthosilicate (TEOS)

Indexed keywords

CATHODES; ELECTRON BEAMS; ION BEAMS; SUBSTRATES;

ELECTRON-SOURCE STRUCTURES;

ELECTRON SOURCES;

EID: 0042863280     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4037     Document Type: Conference Paper

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