Prototyping of field emitter array using focused ion and electron beams

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4311-4313

  Jarupoonphol, Werapong ^a   Ochiai, Chikako ^a   Takai, Mikio ^b   Hosono, Akihiko ^b   Okuda, Soichiro ^a  

^a OSAKA UNIVERSITY   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Electron beam (EB); Field emitter array (FEA); Focused ion beam (FIB)

Indexed keywords

ANNEALING; ELECTRON BEAMS; ELECTRON EMISSION; ETCHING; ION BEAMS; SCANNING ELECTRON MICROSCOPY; SILICA; SPUTTER DEPOSITION;

FIELD EMITTER ARRAYS (FEA);

MICROELECTRONIC PROCESSING;

EID: 0036614694     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4311     Document Type: Article

References (13)