Wedge emitter fabrication using focused ion beam

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 904-906

  Ochiai, C ^a   Sawada, A ^a   Noriyasu, H ^a   Takai, M ^a   Hosono, A ^b   Okuda, S ^b  

^a OSAKA UNIVERSITY   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON EMISSION; ETCHING; ION BEAMS; MOLYBDENUM; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON WAFERS; SPUTTERING; THERMOOXIDATION;

EMISSION CURRENTS; FOCUSED ION BEAM (FIB);

MICROELECTRONIC PROCESSING;

EID: 0035326450     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1349734     Document Type: Conference Paper

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