Microstructures and properties changes induced by a metal vapor vacuum arc chromium interlayer in chromium nitride films

Materials Letters

Volumn 58, Issue 22-23, 2004, Pages 2924-2926

  Chen, Hong Ying ^a   Han, Sheng ^b   Shih, Han C ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL TAICHUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Chromium nitride; Electrical properties; Mechanical properties; Metal vapor vacuum arc; Microstructures; Thin films

Indexed keywords

CHROMIUM; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ION IMPLANTATION; MECHANICAL PROPERTIES; METAL VAPOR LAMPS; MICROSTRUCTURE; NITRIDES; PHASE TRANSITIONS; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

CHROMIUM NITRIDE; ELECTRICAL PROPERTIES; METAL VAPOR VACUUM ARC (MEVVA);

THIN FILMS;

EID: 3242675170     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.05.020     Document Type: Article

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