Residual stress in cemented carbide following a coating process and after an ion implantation post-treatment of the coating

Surface and Coatings Technology

Volumn 108-109, Issue , 1998, Pages 225-229

  Perry, Anthony J ^a   Geist, Daniel E ^b   Rafaja, David ^c  

^a AIMS Marketing   (United States)

^b LOCKHEED MARTIN   (United States)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Cemented carbide; Ion implantation; Residual stress; X ray diffraction

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; COMPRESSIVE STRESS; ION IMPLANTATION; RESIDUAL STRESSES; STRESS ANALYSIS; TENSILE STRESS; TITANIUM CARBIDE; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

CEMENTED CARBIDE; PHYSICAL VAPOR DEPOSITION (PVD);

TUNGSTEN CARBIDE;

EID: 0039774300     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00670-7     Document Type: Article

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