Effects of MEVVA-implanted chromium on the structure and properties of CrN film

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 425-429

  Han, Sheng ^a   Chen, Hong Ying ^b   Chang, Ku Ling ^c   Weng, Ko Wei ^d   Wang, Da Yung ^d   Lu, Fu Hsing ^b   Shih, Han C ^b,c  

^a NATIONAL TAICHUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

^c NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^d MINGDAO UNIVERSITY   (Taiwan)

Author keywords

Annealing; Cathodic arc plasma deposition; Metal vapor vacuum arc; Phase transformation

Indexed keywords

ANNEALING; CHROMIUM; CHROMIUM COMPOUNDS; COATINGS; GRAIN GROWTH; MICROSTRUCTURE; PHASE TRANSITIONS; RESIDUAL STRESSES; SILICON WAFERS; STRESS RELAXATION; THERMAL CONDUCTIVITY; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

CATHODIC ARC PLASMA DEPOSITION; METAL VAPOR VACUUM ARC (MEVVA);

THIN FILMS;

EID: 1342305082     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01119-2     Document Type: Conference Paper

References (19)

1. Han S., Lin J.H., Tsai S.H., Chung S.C., Wang D.Y., Lu F.H., Shih H.C. Surf. Coat. Technol. 133-134:2000;460.
2. Odén M., Ericsson C., Håkansson G., Ljungcrantz H. Surf. Coat. Technol. 144:1999;39.
3. Lai F.D., Wu J.K. Surf. Coat. Technol. 88:1996;183.
4. Chang G.C., Phucharoen W. Surf. Coat. Technol. 32:1987;307.
5. Perry A.J., Jagner M., Sproul W.D., Rudnich P.J. Surf. Coat. Technol. 42:1990;49.
6. Lai F.D., Wu J.K. Surf. Coat. Technol. 64:1994;53.
7. Lu F.-H., Chen H.-Y. Thin Solid Films. 398-399:2001;368.
8. Chen H.-Y., Lu F.-H. J. Vac. Sci. Technol. A. 21:2003;695.
9. Hsieh W.P., Wang W.C., Wang C.C., Shieu F.S. J. Vac. Sci. Technol. A. 19:2001;2235.
10. Almer J., Odén M., Hultman L., Håkansson G. J. Vac. Sci. Technol. A. 18:2000;121.
11. Herr W., Broszeit E. Surf. Coat. Technol. 97:1997;335.
12. Héau C., Fillit R.Y., Vaux F., Pascaretti F. Surf. Coat. Technol. 120-121:1999;200.
13. Mayrhofer P.H., Tischler G., Mitterer C. Surf. Coat. Technol. 142-144:2001;78.
14. Wei G., Rar A., Barnard J.A. Thin Solid Films. 398-399:2001;460.
15. Zhu H.N., Liu B.X. Appl. Surf. Sci. 161:2000;240.
16. Han S., Chen H.-Y., Chang Z.C., Lin J.H., Yang C.J., Lu F.-H., Shieu F.S., Shih H.C. Thin Solid Films. 436:2003;238.
17. Han S., Lin J.H., Guo X.J., Tsai S.H., Su Y.O., Huang J.H., Lu F.-H., Shih H.C. Thin Solid Films. 377-378:2000;578.
18. Cullity B.D. Elements of X-ray Diffraction. second ed. 1978;351 Addison-Wesley, Reading, MA.
19. Bost M.C., Mahan J.E. J. Appl. Phys. 63:1988;839.