Effect of metal vapor vacuum arc Cr-implanted interlayers on the microstructure of CrN film on silicon

Thin Solid Films

Volumn 436, Issue 2, 2003, Pages 238-243

  Han, Sheng ^b   Chen, Hong Ying ^c   Chang, Zue Chin ^c   Lin, Jian Hong ^a   Yang, Ching Jung ^c   Lu, Fu Hsing ^c   Shieu, Fuh Sheng ^c   Shih, Han C ^a,c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL TAICHUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^c NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Metal vapor vacuum arc; Residual stress; Secondary ion mass spectrometry; Transmission electron microscopy

Indexed keywords

DIFFRACTION; MICROSTRUCTURE; RESIDUAL STRESSES; SECONDARY ION MASS SPECTROMETRY; SILICON; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

METAL VAPOR VACUUM ARC (MEVVA);

CHROMIUM COMPOUNDS;

EID: 0037863224     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00600-X     Document Type: Article

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