SiO2 and Si3N4 etch mechanisms in NF 3/hydrocarbon plasma

Journal of Physics D: Applied Physics

Volumn 39, Issue 4, 2006, Pages 673-684

  Machima, Puthajat ^a   Hershkowitz, Noah ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GLOBAL WARMING; HYDROCARBONS; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

ETCH RATES; FEED GASES; HYDROCARBON CHEMISTRY;

PLASMAS;

EID: 32144442910     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/4/013     Document Type: Article

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