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Volumn 91, Issue 5, 2002, Pages 3452-3458

Subsurface reactions of silicon nitride in a highly selective etching process of silicon oxide over silicon nitride

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Indexed keywords


EID: 33845436392     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448870     Document Type: Article
Times cited : (18)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.