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Volumn 91, Issue 5, 2002, Pages 3452-3458
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Subsurface reactions of silicon nitride in a highly selective etching process of silicon oxide over silicon nitride
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 33845436392
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1448870 Document Type: Article |
Times cited : (18)
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References (17)
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