Isotope effects in low-energy ion-induced splitting

Proceedings - Electrochemical Society

Volumn PV 2005-03, Issue , 2005, Pages 155-166

  Terreault, B ^a   Chicoine, M ^b   Desrosiers, N ^a   Giguere A ^a   Hobler, G ^c   Moutanabbir, O ^a   Ross, G G ^a   Schiettekatte, F ^b   Simpson, P J ^d   Zahel, T ^c  

^a INRS EMT   (Canada)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^d UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; ISOTOPES; MONTE CARLO METHODS; POSITRON ANNIHILATION SPECTROSCOPY; RAMAN SCATTERING; SEMICONDUCTING GALLIUM ARSENIDE;

HYDROGEN CHEMISTRY; ION RATIOS; ION-INDUCED SPLITTING;

SEMICONDUCTING SILICON;

EID: 31944450054     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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