Proportionality of vacancy concentration to ion implantation fluence

Journal of Applied Physics

Volumn 92, Issue 10, 2002, Pages 5852-5855

  Simpson, P J ^a   Szpala, S ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DAMAGE CASCADES; DEFECT DIFFUSION; FLUENCES; IMPLANTATION FLUENCE; ION FLUENCES; SUBLINEAR; VACANCY ACCUMULATION; VACANCY CONCENTRATION; VACANCY PRODUCTION;

GERMANIUM; POSITRON ANNIHILATION SPECTROSCOPY;

ION IMPLANTATION;

EID: 0037112962     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1516265     Document Type: Article

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