Non-destructive structural analysis of surface blistering by TEM and EELS in a reflection configuration

Journal of Nuclear Materials

Volumn 290-293, Issue , 2001, Pages 131-134

  Muto, S ^a   Matsui, T ^a   Tanabe, T ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEUTERIUM; ELECTRON DIFFRACTION; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; HELIUM; ION BOMBARDMENT; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; NONDESTRUCTIVE EXAMINATION;

SURFACE BLISTERING;

PLASMAS;

EID: 0035278391     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(00)00556-0     Document Type: Article

References (6)

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3. P.B. Hirsch, A. Howie, R.B. Nicholson, D.W. Pashley, M.J. Whelan, Electron Microscopy of Thin Crystals, Krieger, New York, 1977 (Chapter 4).
4. K. Furuya, M. Song, Y. Fukuda, T. Noda, T. Saito, J. Surf. Anal. 3 (1997) 233.
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6. J. Weertman, J.R. Weertman, Elementary Dislocation Theory, Macmillan, New York, 1964 (Chapter 1).