The density and binding effects in sputtering by ions of widely varying masses

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 195, Issue 3-4, 2002, Pages 291-301

  Shulga, V I ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

Computer simulation; Density and binding effects; Sputtering; Sputtering yield

Indexed keywords

AMORPHOUS MATERIALS; APPROXIMATION THEORY; BINDING ENERGY; COMPUTER SIMULATION; HEAVY IONS; POLYCRYSTALLINE MATERIALS; SPUTTERING; TARGETS;

BINDING EFFECTS; ION ENERGY;

ATOMIC PHYSICS;

EID: 0036798660     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01108-4     Document Type: Article

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