Integrated nano-optic devices based on immersion nano-gratings made by imprint lithography and nano-trench-filling technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5931, Issue , 2005, Pages 1-12

  Wang, Jian ^a   Deng, Xuegong ^a   Sciortino, Paul ^a   Varghese, Ron ^a   Nikolov, Anguel ^a   Liu, Feng ^a   Liu, Xiaoming ^a   Chen, Lei ^a  

^a NanoOpto Corporation   (United States)

Author keywords

Atomic layer deposition; Integrated optics; Multilayer; Nano optics; Nanoimprint lithography; Polarizer; Retarder; Waveplate

Indexed keywords

NANO-OPTICS; NANOIMPRINT LITHOGRAPHY; POLARIZER; RETARDER;

DEPOSITION; DIELECTRIC MATERIALS; LITHOGRAPHY; MULTILAYERS; OPTICAL DEVICES;

NANOTECHNOLOGY;

EID: 31744432956     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.615951     Document Type: Conference Paper

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