Layering of ultrathin SiO2 film and study of its growth kinetics

Applied Physics Letters

Volumn 84, Issue 25, 2004, Pages 5192-5194

  Gayathri, N ^a,b   Banerjee, S ^a  

^a SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^b INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CRYSTAL ORIENTATION; DENSITY MEASUREMENT (SPECIFIC GRAVITY); FILM GROWTH; HIGH TEMPERATURE EFFECTS; REACTION KINETICS; REFRACTIVE INDEX; SILICA; SURFACE ROUGHNESS; THERMOOXIDATION; THICKNESS MEASUREMENT; X RAY ANALYSIS;

ELECTRON DENSITY PROFILE (EDP); GRAZING INCIDENCE X-RAY REFLECTIVITY (GIXR); X-RAY SYNCHROTRON SOURCES;

ULTRATHIN FILMS;

EID: 3142768979     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1764931     Document Type: Article

References (19)

1. M. L. Green, E. P. Gusev, R. Degraeve, and E. L. Garfunkel, J. Appl. Phys. 90, 2057 (2001).
2. R. S. Muller, T. L. Kamins, and M. Chan, Device Electronics for Integrated Circuits, 3rd ed. (Wiley, New York, 2003), Chapter 3, p. 56.
3. B. E. Deal and A. S. Grove, J. Appl. Phys. 36, 3770 (1965).
4. S. Banerjee, Y. J. Park, D. R. Lee, Y. H. Jeong, K.-B. Lee, S. B. Yoon, B. H. Jo, H. M. Choi, and W.-J. Cho, Appl. Phys. Lett. 72, 433 (1998).
5. K. Taniguichi, M. Tanaka, C. Hamguchi, and K. Imai, J. Appl. Phys. 67, 2195 (1990).
6. B. Li, T. Fujimoto, and I. Kojima, J. Vac. Sci. Technol. A 17, 552 (1999).
7. B. J. Mrstik, V. V. Afanas'ev, A. Stesmans, P. J. McMarr, and R. K. Lawrence, J. Appl. Phys. 85, 6577 (1999).
8. W. K. Choi, C. K. Choo, K. K. Han, J. H. Chen, F. C. Loh, and K. L. Tan, J. Appl. Phys. 83, 2308 (1998).
9. S. Banerjee, S. Chakraborty, and P. T. Lai, Appl. Phys. Lett. 80, 3075 (2002).
10. A. Gibaud, X-ray and Neutron Reflectivity: Principles and Applications, edited by J. Daillant and A. Gibaud (Springer, Heidelberg, 1999), Chap. 3, p. 87.
11. L. G. Parratt, Phys. Rev. 131, 359 (1954).
12. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, London, 1980).
13. T. P. Russel, Mater. Sci. Rep. 5, 171 (1990).
14. S. Banerjee, S. Ferrari, D. Chaterigner, and A. Gibaud, Thin Solid Films 450, 23 (2004).
15. S. Banerjee, A. Gibaud, D. Chaterigner, S. Ferrari, C. Wiemer, and D. T. Dekadjevi, Appl. Phys. Lett. 80, 512 (2002).
16. J. Wang, D. R. Lee, C. Park, Y. H. Jeong, K.-B. Lee, Y. J. Park, S. B. Youn, J.-C. Park, H. M. Choi, and Y.-J. Huh, Appl. Phys. Lett. 75, 3775 (1999).
17. S. D. Kosowsky, P. S. Pershan, K. S. Krisch, J. Bevk, M. L. Green, D. Brasen, L. C. Feldman, and P. K. Roy, Appl. Phys. Lett. 70, 3119 (1997).
18. N. Awaji, Spring-8 Research Frontiers 2001B/2001A, 2002, p. 92.
19. N. Awaji, Y. Sugita, T. Nakanishi, S. Ohkubo, K. Takasaki, and S. Komiya, J. Vac. Sci. Technol. A 14, 971 (1996).