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Volumn 80, Issue 3, 2002, Pages 512-514

Study on the effect of plasma treatment on TiN films in N 2/H2 atmosphere using x-ray reflectivity and secondary ion mass spectroscopy

(6) Banerjee, S a,b Gibaud, A a Chateigner, D a Ferrari, S c Wiemer, C c Dekadjevi, D T c

a UNIVERSITÉ DU MAINE (France)

b SAHA INSTITUTE OF NUCLEAR PHYSICS (India)

c LABORATORIO MDM (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL EVOLUTION; DISTORTED WAVE BORN APPROXIMATION; ELECTRON DENSITY PROFILES; GRAZING INCIDENCE X-RAY REFLECTIVITIES; MATRIX METHODS; PHYSICAL PARAMETERS; PLASMA TREATMENT; SECONDARY ION MASS SPECTROSCOPY; TIME-OF-FLIGHT SECONDARY ION MASS SPECTROSCOPY; TIN FILMS; X RAY REFLECTIVITY;

BORN APPROXIMATION; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; DEPTH PROFILING; MASS SPECTROMETERS; METALLIC FILMS; PLASMA DEPOSITION; PLASMAS; REFLECTION; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; TITANIUM NITRIDE; X RAYS;

X RAY ANALYSIS;

EID: 79955988771 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1435406 Document Type: Article

Times cited : (10)

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