High-precision x-ray reflectivity study of ultrathin SiO2 on Si

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 971-976

  Awaji, N ^a   Sugita, Y ^a   Nakanishi, T ^a   Ohkubo, S ^a   Takasaki, K ^a   Komiya, S ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001143749     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580424     Document Type: Article

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