Optical properties of titania films prepared by off-plane filtered cathodic vacuum arc

Journal of Crystal Growth

Volumn 268, Issue 3-4 SPEC. ISS., 2004, Pages 543-546

  Zhao, Z W ^a   Tay, B K ^a   Lau, S P ^a   Yu, G Q ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

A3. Physical vapor deposition processes; B1. Oxides; B2. Dielectric materials

Indexed keywords

AMORPHOUS FILMS; BINDING ENERGY; DIELECTRIC MATERIALS; ENERGY GAP; PHYSICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SOL-GELS; STOICHIOMETRY; THERMAL EFFECTS; TITANIUM OXIDES;

OPTICAL BAND GAP; TITANIA FILMS;

THIN FILMS;

EID: 3142749113     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.04.088     Document Type: Conference Paper

References (30)

1. Butler M.A., Ginley D.S. J. Mater. Sci. 15:1980;19.
2. Beck U., Smith D.T., Reiners G., Dapkunas S.J. Thin Solid Films. 332:1998;164.
3. Carlson T., Griffin G.L. J. Phys. Chem. 90:1986;5896.
4. Campbell S.A., Gilmer D.C., Wang X., Hsich M.T., Kim H.S., Gladfelter W.L., Yan J.H. IEEE Trans. Electron Devices. 44:1997;104.
5. X. Guo, X. Wang, Z. Luo, T.P. Ma, T. Tamagawa, Tech. Dig. Int. Electron Devices Meeting, 1999, p. 137.
6. Zhang F., Zheng Z., Ding X., Mao Y., Chen Y., Zhou Z., Yang S., Liu X. J. Vac. Sci. Technol. A. 15:1997;1824.
7. Huang N., Chen Y., Luo J., et al. J. Biomater. Appl. 8:1994;404.
8. Larsson C., Thomsen P., Lausmaa J., Rodahl M., Kasemo B., Ericson L.E. Biomaterials. 15:1994;1062.
9. Battiston G.A., Berbasi R., Porchia M., Marigo A. Thin Solid Films. 239:1994;186.
10. Williams L.M., Hess D.W. J. Vac. Sci. Technol. A. 1:1983;1810.
11. Tang H., Berger H., Schmid P.E., Levy F. Solid State Commun. 92:1994;267.
12. Ben Amor S., Baud G., Besse J.P., Jacquet M. Thin Solid Films. 293:1997;163.
13. Martin N., Rousselot C., Rondot D., Palmino F., Mercier R. Thin Solid Films. 300:1997;113.
14. Sabate J., Anderson M.A., Kikkawa H., Xu Q., Cervera-March S., Hill C.G. J. Catal. 134:1992;36.
15. Zhang F., Wang X., Li C., Wang H., Chen L., Liu X. Surf. Coat. Technol. 110:1998;136.
16. Zhang F., Liu X. Thin Solid Films. 326:1998;171.
17. Bendavid A., Martin P.J., Jamting Å., Takikawa H. Thin Solid Films. 355-356:1999;6.
18. Bendavid A., Martin P.J., Takikawa H. Thin Solid Films. 360:2000;241.
19. Mandl S., Thorwarth G., Rauschenbach B. Surf. Coat. Technol. 133-134:2000;283.
20. X. Shi, B.K. Tay, H.S. Tan, Filtered Cathodic Arc Source, US Patent No. 6031239 (29 February 2000).
21. Shi X., Tay B.K., Lau S.P. Int. J. Mod. Phys. B. 14:2000;136.
22. W. Theiss (Ed.), Scout Thin Film Analysis Software Handbook, Hard- and Software, Aachen, Germany.
23. Sayers C.N., Armstrong N.R. Surf. Sci. 77:1978;301.
24. Simon D., Perrin C., Bardolle J. J. Microsc. Spectrosc. Electron. 1:1976;175.
25. Nefedov V.I., Salyn Y.V., Chertkov A.A., Padurets L.N. Zh. Neorg. Khim. 19:1974;1443.
26. Sanjines R., Tang H., Berger H., Gozzo F., Margaritondo G., levy F. J. Appl. Phys. 75:1994;2945.
27. Yamada Y., Uyama H., Murata R., Nozoye H. J. Vac. Sci. Technol. A. 19:2001;2479.
28. Nakamura M., Kato S., Aoki T., Sirghi L., Hatanaka Y. Thin Solid Films. 401:2001;138.
29. Suhail M.H., Mohan Rao G., Mohan S. J. Appl. Phys. 71:1992;1421.
30. Takikawa H., Matsui T., Sakakibara T., Bendavid A., Martin P.J. Thin Solid Films. 348:1999;145.