Low temperature deposition of titanium-oxide films with high refractive indices by oxygen-radical beam assisted evaporation combined with ion beams

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2479-2482

  Yamada, Yasumi ^a   Uyama, Haruo ^a   Murata, Takanori ^b   Nozoye, Hisakazu ^c  

^a TOPPAN PRINTING CO LTD   (Japan)

^b Shincron Co Ltd   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON IRRADIATION; EVAPORATION; ION BEAMS; ION BOMBARDMENT; KINETIC ENERGY; LOW TEMPERATURE EFFECTS; OXYGEN; REFRACTIVE INDEX; SUBSTRATES; TITANIUM DIOXIDE;

OXYGEN-RADICAL BEAM ASSISTED EVAPORATION (O-RBAE);

OPTICAL FILMS;

EID: 0035443332     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1388617     Document Type: Article

References (16)