Electron beam fluorescence temperature measurements of N 2 in a semiconductor plasma reactor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 371-376

  Shimada, M ^a   Cattolica, R ^a   Tynan, G R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION SPECTRUM; MOLECULAR GAS; THERMAL PLASMA ELECTRONS;

COMPUTATIONAL METHODS; DISSOCIATION; ELECTRON BEAMS; ETCHING; FLUORESCENCE; HEATING; LIGHT EMISSION; MOLECULAR DYNAMICS; NITROGEN; PLASMA DENSITY; PLASMA SIMULATION; POSITIVE IONS; PRESSURE EFFECTS; THERMAL EFFECTS;

INDUCTIVELY COUPLED PLASMA;

EID: 1842608468     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1644113     Document Type: Article

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